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<source>
  <jobs>
    <job>
      <externalid>f4f43c9b-c78</externalid>
      <Title>R&amp;D Engineering, Sr Staff Engineer</Title>
      <Description><![CDATA[<p>You will join a dynamic engineering team focused on developing and delivering best-in-class lithography and mask synthesis solutions. As a Sr Staff Engineer, you will collaborate directly with customers and internal R&amp;D teams to understand and address technical challenges in mask synthesis and lithography.</p>
<p>Your primary responsibilities will include:</p>
<ul>
<li>Collaborating with customers and internal R&amp;D teams to understand and address technical challenges in mask synthesis and lithography.</li>
<li>Translating customer requirements into comprehensive Product Requirement Documents (PRDs), shaping product direction and roadmap.</li>
<li>Reviewing and approving functional specifications to ensure alignment with customer needs and technical feasibility.</li>
<li>Conducting early-stage testing of new features and functionalities during development cycles, providing critical feedback for product refinement.</li>
<li>Prototyping advanced OPC/RET solutions and partnering with R&amp;D to drive their transition into robust, production-ready tools.</li>
<li>Supporting field Application Engineers (AEs) and customers in debugging and resolving complex production issues.</li>
<li>Developing training materials and delivering technical workshops to internal teams and external customers.</li>
</ul>
<p>By joining our team, you will accelerate the adoption of cutting-edge OPC and RET technologies, enabling customers to achieve higher yields and better device performance. You will also influence product strategy and feature development by consolidating customer feedback and industry trends.</p>
<p>To succeed in this role, you will need:</p>
<ul>
<li>A PhD or Master’s degree in Physics, Computer Science, Electrical Engineering, or related field.</li>
<li>Minimum 3+ years in Lithography, OPC/RET, and mask synthesis.</li>
<li>Proficiency in Linux/UNIX environments and Python scripting for process automation and prototyping.</li>
<li>Comprehensive understanding of mask synthesis challenges and workflows in semiconductor foundries.</li>
<li>Strong analytical skills and a proven track record of solving complex technical problems.</li>
<li>Excellent written and verbal communication skills in English.</li>
<li>Broad knowledge of state-of-the-art RET, ILT, and OPC solutions.</li>
</ul>
<p style="margin-top:24px;font-size:13px;color:#666;">XML job scraping automation by <a href="https://yubhub.co">YubHub</a></p>]]></Description>
      <Jobtype>full-time</Jobtype>
      <Experiencelevel>senior</Experiencelevel>
      <Workarrangement>onsite</Workarrangement>
      <Salaryrange></Salaryrange>
      <Skills>Lithography, OPC/RET, Mask synthesis, Linux/UNIX, Python scripting, Semiconductor foundries, RET, ILT, OPC</Skills>
      <Category>Engineering</Category>
      <Industry>Technology</Industry>
      <Employername>Synopsys</Employername>
      <Employerlogo>https://logos.yubhub.co/careers.synopsys.com.png</Employerlogo>
      <Employerdescription>Synopsys is a leading provider of electronic design automation (EDA) software and services. It was founded in 1986 and has since grown to become a global company with over 10,000 employees.</Employerdescription>
      <Employerwebsite>https://careers.synopsys.com</Employerwebsite>
      <Compensationcurrency></Compensationcurrency>
      <Compensationmin></Compensationmin>
      <Compensationmax></Compensationmax>
      <Applyto>https://careers.synopsys.com/job/hsinchu/r-and-d-engineering-sr-staff-engineer/44408/92910391088</Applyto>
      <Location>Hsinchu</Location>
      <Country></Country>
      <Postedate>2026-04-05</Postedate>
    </job>
    <job>
      <externalid>6c57cc00-ceb</externalid>
      <Title>R&amp;D Engineering, Staff Engineer OPC</Title>
      <Description><![CDATA[<p>We are seeking a Staff Engineer OPC to join our R&amp;D team. As a Staff Engineer OPC, you will be responsible for collaborating directly with customers and internal R&amp;D teams to understand and address technical challenges in mask synthesis and lithography.</p>
<p><strong>What you&#39;ll do</strong></p>
<ul>
<li>Collaborating directly with customers and internal R&amp;D teams to understand and address technical challenges in mask synthesis and lithography.</li>
<li>Translating customer requirements into comprehensive Product Requirement Documents (PRDs), shaping product direction and roadmap.</li>
<li>Reviewing and approving functional specifications to ensure alignment with customer needs and technical feasibility.</li>
<li>Conducting early-stage testing of new features and functionalities during development cycles, providing critical feedback for product refinement.</li>
<li>Prototyping advanced OPC/RET solutions and partnering with R&amp;D to drive their transition into robust, production-ready tools.</li>
<li>Supporting field Application Engineers (AEs) and customers in debugging and resolving complex production issues.</li>
<li>Developing training materials and delivering technical workshops to internal teams and external customers.</li>
<li>Collaborating with R&amp;D and technical publications teams to produce release notes and comprehensive documentation.</li>
</ul>
<p><strong>What you need</strong></p>
<ul>
<li>PhD or Master’s degree in Physics, Computer Science, Electrical Engineering, or related field.</li>
<li>Minimum 3+ years in Lithography, OPC/RET, and mask synthesis.</li>
<li>Proficiency in Linux/UNIX environments and Python scripting for process automation and prototyping.</li>
<li>Comprehensive understanding of mask synthesis challenges and workflows in semiconductor foundries.</li>
<li>Strong analytical skills and a proven track record of solving complex technical problems.</li>
<li>Excellent written and verbal communication skills in English.</li>
<li>Broad knowledge of state-of-the-art RET, ILT, and OPC solutions.</li>
</ul>
<p style="margin-top:24px;font-size:13px;color:#666;">XML job scraping automation by <a href="https://yubhub.co">YubHub</a></p>]]></Description>
      <Jobtype>employee</Jobtype>
      <Experiencelevel>staff</Experiencelevel>
      <Workarrangement>onsite</Workarrangement>
      <Salaryrange></Salaryrange>
      <Skills>PhD or Master’s degree in Physics, Computer Science, Electrical Engineering, or related field, Minimum 3+ years in Lithography, OPC/RET, and mask synthesis, Proficiency in Linux/UNIX environments and Python scripting for process automation and prototyping, Comprehensive understanding of mask synthesis challenges and workflows in semiconductor foundries, Strong analytical skills and a proven track record of solving complex technical problems, Excellent written and verbal communication skills in English, Broad knowledge of state-of-the-art RET, ILT, and OPC solutions, Curious and passionate about advancing semiconductor technology, Self-motivated, adaptable, and able to thrive in a fast-paced environment, Collaborative team player with strong interpersonal skills, Detail-oriented and organized, able to manage multiple projects simultaneously, Effective communicator, able to bridge technical and business perspectives</Skills>
      <Category>Engineering</Category>
      <Industry>Technology</Industry>
      <Employername>Synopsys</Employername>
      <Employerlogo>https://logos.yubhub.co/careers.synopsys.com.png</Employerlogo>
      <Employerdescription>Synopsys software engineers are key enablers in the world of Electronic Design Automation (EDA), developing and maintaining software used in chip design, verification and manufacturing.</Employerdescription>
      <Employerwebsite>https://careers.synopsys.com</Employerwebsite>
      <Compensationcurrency></Compensationcurrency>
      <Compensationmin></Compensationmin>
      <Compensationmax></Compensationmax>
      <Applyto>https://careers.synopsys.com/job/hsinchu/r-and-d-engineering-staff-engineer-opc/44408/92407720880</Applyto>
      <Location>Hsinchu</Location>
      <Country></Country>
      <Postedate>2026-03-06</Postedate>
    </job>
  </jobs>
</source>